Trapping DNA Using Metallized Nanopores

The complete sequence of chemical base pairs that make up DNA achieved by the Human Genome Project in 2003 provided new avenues for advances in medicine and biotechnology. However for these benefits to be available to the majority of the population there must be a method of individual DNA sequencing that is inexpensive, fast and accurate. To this purpose many methods are being studied and developed. Amongst these, is the usage of nanometric scale pores, through which potentially, DNA can transverse and each base pair identified. Nanopores are a promising form of DNA sequencing because of the low cost, label free and automated nature of the structure. However, the current configuration has a translocation rate which surpasses the available bandwidth capacities. We believe that a metal coated nanopore could yield better trapping capabilities than its metal-free SiO2 counterpart. This presentation will report efforts to slow down DNA strands as they translocate through the nanopore using different types of nanopore diameters (10-50 nm), various coating metals used and different thickness of metallized surfaces. Films are characterized by transmission electron microscopy, and coated with focused electron beam vaporizing and tested using reservoirs of ionic solutions for current change during DNA translocation. Our goal is to detect a slower rate of change in the current fluctuations using metallized nanopores. Furthermore we wish to know by what percentage is the diameter of the nanopore obstructed using the vaporization method to coat the SiO2 layer with different combinations of metals.